ASML Holding NV
Information Technology
Current price
Target price 00%
Ranks rating
76
Position in sub-industry
100 / 375
Position in country
78 / 223
Return on Assets, %
20.7
4.4
Net income margin, %
28.3
7.8
EBITDA margin, %
35.8
14.2
Debt to Equity, %
34.4
25.6
Intangible assets and goodwill, %
13.3
1.2
Revenue CAGR 3Y, %
25.3
11
Total Equity change 1Y, %
57.4
2.5
Revenue Y, % chg
35.1
-8.4
P/E
45.4
30.1
P/BV
26.2
2.3
P/S
13.1
2.8
EV/S
13.1
2.8
EV/EBITDA
37.1
15.9
Average Analyst recommendation
Buy
Buy
Average upside forecasts, %
3.9
23
Forward P/E
41
21
Dividend Yield, %
0.6
1.2
Forward Dividend Yield, %
0.8
0
Expected dividend per share
8
0.1
Payout Ratio, %
59.8
19.6
Dividend Ex Date
2024-02-05
Competitors
Ranks
-
ASM International NV
00%
-
Applied Materials Inc
00%
-
Advantest Corp
00%
-
BE Semiconductor Industries NV
00%
-
ASML Holding NV
00%
-
Disco Corp
00%
-
KLA Corp
00%
-
Tokyo Electron Ltd
00%
-
Teradyne Inc
00%
-
Lam Research Corp
00%
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Company information
Country
Netherlands
Sector
Information Technology
Industry group
Semiconductors & Semiconductor Equipment
Industry
Semiconductors & Semiconductor Equipment
Sub-sector
Information Technology
Capitalization (millions of $)
388876
Ticker
ASML.OQ
ISIN
USN070592100
IPO date
1995-02-01
Availability on Russian exchanges
No
Reporting for
2024-02-14
Date fact. publication of reports
2023-12-31
Company Description
ASML Holding N.V. is a holding company. The Company is a manufacturer of chip-making equipment. The Company is engaged in the development, production, marketing, selling and servicing of semiconductor equipment systems, consisting of lithography systems. The Company's products include systems, and installed base products and services. The Company's principal operations are in the Netherlands, the United States and Asia. The Company offers TWINSCAN systems, equipped with lithography system with a mercury lamp as light source (i-line), Krypton Fluoride (KrF) and Argon Fluoride (ArF) light sources for 300 millimeter processing wafers for manufacturing environments for which imaging at a small resolution is required. TWINSCAN systems also include immersion lithography systems (TWINSCAN immersion systems). The Company also offers NXE systems, which are equipped with extreme ultraviolet (EUV) light source technology. The Company offers YieldStar, a wafer metrology system.
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